Semiconductor Sensor Structures with Reduced Dislocation Defect Densities and Related Methods for the Same

ABSTRACT

Non-silicon based semiconductor devices are integrated into silicon fabrication processes by using aspect-ratio-trapping materials. Non-silicon light-sensing devices in a least a portion of a crystalline material can output electrons generated by light absorption therein. Exemplary light-sensing devices can have relatively large micron dimensions. As an exemplary application, complementary-metal-oxide-semiconductor photodetectors are formed on a silicon substrate by incorporating an aspect-ratio-trapping technique.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a continuation of U.S. patent applicationSer. No. 13/594,519, filed Aug. 24, 2012, entitled “METHOD FORSEMICONDUCTOR SENSOR STRUCTURES WITH REDUCED DISLOCATION DEFECTDENSITIES,” which is a divisional of U.S. patent application Ser. No.12/565,863, filed Sep. 24, 2009, entitled “SEMICONDUCTOR SENSORSTRUCTURES WITH REDUCED DISLOCATION DEFECT DENSITIES,” which claimspriority from U.S. Provisional Patent Application Ser. No. 61/099,902,filed Sep. 24, 2008, entitled “Improved Semiconductor Sensor Structureswith Reduced Dislocation Defect Densities and Related Methods for theSame;” the above applications are incorporated by reference herein intheir entireties and for which benefit of the priority dates is herebyclaimed.

TECHNICAL FIELD OF THE DISCLOSURE

The technical field of this disclosure relates to the art ofsemiconductor devices; and more particularly to the art of methods ofmaking semiconductor devices using aspect-ratio-trapping techniques andsemiconductor devices made thereof.

BACKGROUND OF THE DISCLOSURE

There is a constant drive within the semiconductor industry to increasethe performance and reduce the cost of semiconductor devices, such asphotodetectors, diodes, light-emitting diodes, transistors, latches, andmany other semiconductor devices. This drive has resulted in continualdemands for integrating one type of semiconductor devices into anothersemiconductor process.

For example in photodetectors that are comprised of an array of p-njunctions or p-i-n structures, it is advantages to make the p-njunctions and/or p-i-n structures with low band-gap materials, such asgermanium (Ge) and InGaAs, because the photodetectors are able to detectinfrared light. In favor of the cost-efficiency, it is desired toproduce a thin film of III-V or other non-silicon materials on low-costlarge-size silicon wafers to reduce the cost of high performance III-Vdevices. It is further desired to integrate non-silicon p-n junctionsand/or p-i-n structures (e.g. Ge or InGaAs based) into a silicon processsuch that other circuitry in a system, such as a photodetector, can befabricated using a standard silicon process, such as a standard CMOS(complementary-metal-oxide-semiconductor) process. It is also desirableto fabricate the non-silicon devices and silicon CMOS in a co-planarmanner, so that the interconnection and integration of the whole systemcan be conducted in a manner compatible with standard and low-cost CMOSprocess. Further, it is desirable to increase a size of non-siliconregions configured to output electrons generated by light absorptiontherein.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 a diagrammatically illustrates a first step of an exemplarymethod of making a semiconductor device;

FIG. 1 b diagrammatically illustrates a second step of the exemplarymethod of making the semiconductor device;

FIG. 1 c diagrammatically illustrates a third step of the exemplarymethod of making the semiconductor device;

FIG. 1 d diagrammatically illustrates a fourth step of the exemplarymethod of making the semiconductor device;

FIG. 2 diagrammatically illustrates a cross-sectional view of anexemplary structure having an epitaxial-lateral-overgrowth at or inwhich a semiconductor device can be fabricated;

FIG. 3 diagrammatically illustrates a cross-sectional view of anexemplary structure having a large lateral intrinsic region;

FIG. 4 diagrammatically illustrates a top view of an exemplary layout ofmultiple trenches in a substrate capable for growing epitaxialcrystalline materials;

FIG. 5 diagrammatically illustrates an exemplary structure havingnon-silicon semiconductor devices integrated in a silicon process;

FIG. 6 diagrammatically illustrates an exemplary structure having ap-i-n structure formed in a shallow-trench-insulator region;

FIG. 7 diagrammatically illustrates another exemplary structure having ap-i-n structure formed in a shallow-trench-insulator region;

FIG. 8 is a diagram of a portion of an exemplary array ofphotodetectors;

FIG. 9 diagrammatically illustrates an energy-band structure of a p-i-nstructure at zero bias voltage;

FIG. 10 diagrammatically illustrates the energy-band structure of thep-i-n structure in FIG. 9 at a bias voltage;

FIG. 11 is a diagram showing a portion of the array of photodetectors inFIG. 8;

FIG. 12 diagrammatically illustrates an exemplary configuration of thetransistors in the photodetector array in FIG. 8;

FIG. 13 diagrammatically illustrates another exemplary configuration ofthe transistors in the photodetector array in FIG. 8;

FIG. 14 diagrammatically illustrates an exemplary configuration of thep-i-n structure connected to a transistor in the photodetector array inFIG. 8;

FIG. 15 diagrammatically illustrates a cross-sectional view of anexemplary semiconductor device formed at or in a coalesced region formedby adjacent ART (aspect-ratio-trapping) structures;

FIG. 16 diagrammatically illustrates a cross-sectional view of anotherexemplary semiconductor device formed at or in a coalesced region formedby adjacent ART (aspect-ratio-trapping) structures;

FIG. 17 diagrammatically illustrates a cross-sectional view of anexemplary structure having a semiconductor device formed on a gradedbuffer layer in an opening of a dielectric layer;

FIG. 18 diagrammatically illustrates a cross-sectional view of anexemplary structure having a semiconductor device formed on a gradedbuffer layer in a trench formed in a crystalline substrate;

FIG. 19 a diagrammatically illustrates a cross-sectional view of aportion of an exemplary array of non-silicon photodetectors integratedin a silicon substrate, wherein the photodetector is capable ofdetecting light incident thereto from the top;

FIG. 19 b diagrammatically illustrates a top view of a portion of thephotodetectors in FIG. 19 a;

FIG. 20 a diagrammatically illustrates a cross-sectional view of aportion of an exemplary array of non-silicon photodetectors integratedin a silicon substrate, wherein the photodetector is capable ofdetecting light incident thereto from the side;

FIG. 20 b diagrammatically illustrates a top view of a portion of thephotodetectors in FIG. 20 a;

FIG. 21 a diagrammatically illustrates a first view of an exemplaryconfiguration of electrical connections of photodetectors to electricalcontacts;

FIG. 21 b diagrammatically illustrates a second view of the exemplaryconfiguration of electrical connections of photodetectors to electricalcontacts; and

FIG. 22 is a cross-section of an exemplary semiconductor device having anon-isolated defect region.

DETAILED DESCRIPTION OF SELECTED EXAMPLES

Disclosed herein is a method of making semiconductor devices andsemiconductor devices made thereof.

The method enables integration of non-silicon semiconductor devices intoa silicon process such that silicon circuitry of the semiconductordevice can be formed through standard silicon processes. Thisintegration capability can be of great importance in using lowband-width or high band-width semiconductor materials for making asemiconductor device having p-n and p-i-n structures in siliconprocesses.

The method also enables forming ART (aspect-ratio-trapping) crystallinestructures in a trench structure, such as a trench structure patternedby a trench patterning-process (e.g. a standardcomplementary-metal-oxide-semiconductor (CMOS) STI(shallow-trench-insulation) process) or a STI-like trench patternedstructure. The semiconductor devices formed at or in the ARTstructure(s) can have any desired lateral and/or vertical dimensionsthat are substantially free from the aspect-ratio requirements orprocess limitations in most current ART techniques. For demonstrationand simplicity purposes, the method will be discussed with reference toselected examples wherein ART crystalline structures are formed on STIprocess trench structures in some of the examples. It will beappreciated by those skilled in the art that the exemplary methods asdiscussed in the following can also be implemented to form ARTstructures on other types of trenches.

Aspect Ratio Trapping (ART) is a defect reduction and heteroepitaxygrowth technique. As used herein, “ART” or “aspect ratio trapping”refers generally to the technique(s) of causing defects to terminate atnon-crystalline, e.g., dielectric sidewalls during heteroepitaxy growth,where the sidewalls are sufficiently high relative to the size of thegrowth area so as to trap most, if not all, of the defects. ART utilizeshigh aspect ratio openings, such as trenches or holes, to trapdislocations, preventing them from reaching the epitaxial film surface,and greatly reduces the surface dislocation density within the ARTopening. Further details of example ART devices and ART techniques inwhich this invention is described are in U.S. patent application Ser.No. 11/436,198 filed May 17, 2006; Ser. No. 11/493,365 filed Jul. 26,2006; and Ser. No. 11/852,078 filed Sep. 7, 2007, all of which arehereby incorporated by reference.

Furthermore, with customized ART growth parameters, an enhanced lateralepitaxy overgrowth (ELO) mode may be realized for expanded epitaxybeyond the trenched region, e.g., regions with openings formed therein,which yields bulky “free-standing” high quality materials centered abovethe initial trenched seed layer. Therefore, a combined ART and ELOtechnology greatly increases the quality and applicable film surfacearea of lattice-mismatched materials on substrates such as Sisubstrates. The relatively simple process enables reliable andreproducible results.

The method further enables forming a large-scale ART structure in thepresence of STI process trenches, which in turn enables forming asemiconductor device or an element of a semiconductor device withdesired lateral or vertical dimension. In particular, a large-scaleintrinsic semiconductor region can be formed in the large-scale ARTstructure.

The method enables forming a semiconductor device or an element of asemiconductor device on a buffer layer disposed on a semiconductorcrystalline substrate, whereas the buffer layer can be graded. Thebuffer layer can be disposed within an opening formed in a dielectriclayer or can be disposed in a trench formed in a crystalline substrate.

The method also enables forming anisotropic or isotropic ELO(epitaxial-lateral-overgrown) regions, at or in which a semiconductorelement or a semiconductor device can be formed.

The method also enables forming semiconductor devices or elements ofsemiconductor devices in coalesced regions between adjacent ARTstructures.

The method also enables forming lateral p-n and p-i-n structures ofsemiconductor devices at or in an ART structure.

In a particular implementation, the method is capable of being used formaking a semiconductor device havingcomplementary-metal-oxide-semiconductor device with a photodetector thatis formed at or in an ART structure. Other non-silicon or silicon basedcircuitry can also be formed along with the photodetector.

The method and semiconductor devices made thereof will be discussed inthe following with selected examples. It will be appreciated by thoseskilled in the art that the following discussion is for demonstrationpurposes and should not be interpreted as a limitation. Other variationswithin the scope of this disclosure are also applicable.

Referring to the drawings, FIG. 1 a through FIG. 1 d diagrammaticallyillustrate an exemplary method of making an epitaxial structure using anaspect-ratio-trapping (ART) technique. Referring to FIG. 1 a, substrate100 is provided, which can be a semiconductor crystalline substrate,such as a silicon substrate. Dielectric layer 102 comprised of adielectric material is deposited on substrate 100. The dielectricmaterial can be any suitable materials, which is preferably, though notrequired, an oxide or nitride of a semiconductor element, such asSiO_(x) and SiN_(x). Other materials are also applicable, such as anoxide or nitride of a metal element, a metal alloy, or a ceramicmaterial.

Screen layer 104 is deposited on dielectric layer 102. The screen layeris comprised of a material that is highly selective to the etchingprocess to be used for etching substrate 100. For example, screen layer104 can be comprised of TiN_(x) when a dry etching process is to beperformed for forming trenches in substrate 100.

The substrate 100 can be etched by a selected etching process so as toform openings, such as opening 106 in FIG. 1 b. Due to the selectivityof the screen layer 104 to the etching process, the trench (e.g. 106) inthe substrate 100 can have a larger depth or width while stillmaintaining the desired aspect ratio for the following ART growth. Inone example, the opening 106 can have a depth of 100 nanometers orlarger, 200 nanometers or larger, 500 nanometers or larger, 1 micron orlarger, such as 1.5 micron or larger, 2 microns or larger, 3 microns orlarger, or 5 microns or larger. The opening 106 may have a width of 20nanometers or larger, 100 nanometers or larger, 500 nanometers orlarger, 1 micron or larger, such as 1.5 micron or larger, 2 microns orlarger, 3 microns or larger, or 5 microns or larger. The aspect ratio ofthe opening 106 can be 0.5 or higher, such as 1 or higher, 1.5 orhigher.

The opening can then be filled with a selected dielectric material so asto coat the sidewalls 108 of the opening for the following ART growth inthe opening. In one example, dielectric layer 108 at the sidewalls ofthe opening can be comprised of an oxide (e.g. SiO_(x)), a nitride,(e.g. TiN_(x)), or other suitable materials. In another example, thedielectric layer 108 at the sidewall of the opening can be comprised ofTiN_(x) or a material having a free-surface energy substantially equalto or higher than that of TiN_(x).

After coating the sidewalls of the opening 106, the dielectric layer canbe etched so as to remove the dielectric material at the bottom portion110 of the opening for exposing the underneath substrate 100, asdiagrammatically illustrated in FIG. 1 c.

In the formed opening 106 as shown in FIG. 1 c, an ART process can beperformed so as to form epitaxial material 112 as diagrammaticallyillustrated in FIG. 1 d. Exemplary methods for ART processes are setforth in U.S. patent application Ser. No. 11/436,198 filed May 17, 2006;Ser. No. 11/493,365 filed Jul. 26, 2006; and Ser. No. 11/852,078 filedSep. 7, 2007, all of which are hereby incorporated by reference inentirety. The ART structure is comprised of a semiconductor material.For example, the ART structure may be comprised of a group IV element orcompound, a III-V or III-N compound, or a II-VI compound. Examples ofgroup IV elements include Ge and Si; and examples of group IV compoundsinclude SiGe (examples of III-V compounds include aluminum phosphide(AlP), gallium phosphide (GaP), indium phosphide (InP), aluminumarsenide (AlAs), gallium arsenide (GaAs), indium arsenide (InAs),aluminum antimonide (AlSb), gallium antimonide (GaSb), indium antimonide(InSb), and their ternary and quaternary compounds. Examples of III-Ncompounds include aluminum nitride (AlN), gallium nitride (GaN), indiumnitride (InN), and their ternary and quaternary compounds. Examples ofII-VI compounds includes zinc selenide (ZnSe), zinc telluride (ZnTe),cadmium selenide (CdSe), cadmium telluride (CdTe), zinc sulfide (ZnS),and their ternary and quaternary compounds.

The above method of forming ART epitaxial structures and the epitaxialART structures made thereof have many advantages. For example whereinthe substrate is a silicon substrate, a non-silicon crystallinematerial, such as germanium or other semiconductor materials, can beformed in the trench of the substrate. As a consequence, a non-siliconsemiconductor device can be formed at or in the non-silicon crystallineART material, such as a germanium based p-n or p-i-n structure. Othersilicon circuitry of the semiconductor device can thus be formed in orat the silicon substrate using standard silicon processes, an example ofwhich will be described afterwards with reference to FIG. 5.

In another example, the above method enables photodetector pixels to beintegrated into a silicon process. A photodetector pixel comprises a p-nor p-i-n structure and associated circuitry, such as signal convertingcircuits. In some applications, it is desired to make the p-n or p-i-nstructure using a low band-gap material, such as Ge, InGaAs, SiGe, andInP for detecting infrared light. In some other examples, a p-n junctionmade from a high band-gap semiconductor material, such as GaN and InP,is desired for detecting ultra-violet light. The non-siliconsemiconductor elements (e.g. the p-n junction or p-i-n structure) can beformed at or in the ART epitaxial structure comprised of the non-siliconsemiconductor material, such as Ge and InGaAs. Other circuitry of thephotodetector can be formed by using standard silicon processes, such asa standard CMOS process. When the photodetector is desired to have asize larger than a critical threshold, such as equal to or larger than 2microns, or from 2 to 5 microns, an opening in the silicon substrate canbe made to have a width equal to or larger than the desired size of thephotodetector, such as equal to or larger than 2 microns, or from 2 to 5microns. The ART epitaxial crystalline structure formed in the openingcan thus have a width equal to or larger than the desired size of thephotodetector. Further, desired A/R can simultaneously be maintained.

In addition to forming an ART epitaxial crystalline structure within awide opening in a substrate, an ART with a large dimension canalternatively be obtained through overgrowing, as diagrammaticallyillustrated in FIG. 2. Referring to FIG. 2, an opening can have a widthW_(b)) formed in a substrate using, for example a STI technique. Byovergrowing the ART crystalline structure 114 within the opening, anovergrown crystalline portion 116 can be obtained. The overgrowncrystalline portion 116 can have a height H that is 1.5 times or more, 2times or more, 5 times or more, 10 times or more, or from 5 to 10 timesof the height of the opening formed in the substrate. The overgrowncrystalline portion 116 can have a width W that is 1.5 times or more, 2times or more, 5 times or more, 10 times or more, or from 5 to 10 timesof the width W_(b) of the opening formed in the substrate.

The large lateral dimension of the overgrown portion 116 can also beobtained from ELO (epitaxial-lateral-overgrowth). The ELO can beisotropic or anisotropic. For obtaining a flat surface of the overgrownportion 116, a CMP (chemical mechanical polishing) process can beperformed. The overgrown portion 116 can further be patterned so as toobtain desired dimensions (lateral and vertical dimensions and/or theshape) using for example, a photolithography process.

A semiconductor device or an element of a semiconductor device having alarge size (e.g. equal to or larger than 2 microns) can then be formedin the overgrown crystalline portion 116. For example, a p-n or p-i-nstructure with a size of 100 nanometers or more, 500 nanometers or more,1 micron or more, 2 microns or more, 5 microns or more, or 10 microns ormore, or from 5 to 10 microns can be formed at or in the overgrowncrystalline portion 116.

Large ART crystalline structures can alternatively be obtained byforming the ART crystalline structure within a large trench formed in asubstrate, as diagrammatically demonstrated in FIG. 3. Referring to FIG.3, an opening with a large width, such as 100 nanometers or larger, 500nanometers or larger, 1 micron or larger, 2 microns or larger, 5 micronsor larger, 10 microns or larger, or 100 microns or larger, and morepreferably from 100 nanometers to 20 microns, and more preferably, from2 to 5 microns, is formed in substrate 100 that can be a semiconductorcrystalline substrate, such as a silicon substrate. Dielectric patterns,such as dielectric sidewall 101 and dielectric isolators 120 and 124 canbe formed in the opening. The dielectric patterns are provided forenabling the following ART processes for forming ART epitaxialcrystalline structures 118, 122, 126, and 128. Specifically, thedielectric patterns 101 and 120 define an opening with an aspect ratiocommensurate with the aspect ratio needed for forming an ART epitaxialcrystalline structure in the opening between patterns 101 and 120. Thedielectric patterns 120 and 124 define an opening with an aspect ratiocommensurate with the aspect ratio needed for forming an ART epitaxialcrystalline structure in the opening between patterns 120 and 124. Thedielectric patterns 124 and 103 define an opening with an aspect ratiocommensurate with the aspect ratio needed for forming an ART epitaxialcrystalline structure in the opening between patterns 124 and 103. Suchdielectric patterns can be formed in multiple layers (e.g., stackedthree or more vertically).

The dielectric patterns can be formed in many ways. In one example,after forming the large trench in substrate 100 by for example, a STIprocess, a dielectric layer having a dielectric material for dielectricpatterns is deposited in the large opening. The deposited dielectriclayer can be patterned to have a depth H_(d) measured from the bottom ofthe large opening to the top surface of the patterned dielectric layer.The depth H_(d) can have any suitable values, which is preferably equalto or larger than the threshold height within which the ART epitaxialstructure formed in an opening (e.g. the opening between dielectricpattern 101 and 120) has dislocation defects.

The patterned dielectric layer in the large opening can be furtherpatterned so as to form dielectric patterns 101, 120, 124, and 103. Thebottom portions of the openings between dielectric patterns 101 and 120,between 120 and 124, and between 124 and 103 are removed so as to exposethe substrate 100.

With the dielectric patterns formed in the large opening, an ART processcan be performed so as to form ART epitaxial structures 118, 122, and126. By overgrowing the ART structures 118, 122, and 126, overgrowncrystalline portion 128 with a large size can be obtained. The overgrowncrystalline portion 128 can have a width W_(in) that is substantiallyequal to the width of the large opening formed in substrate 100. Forexample, the overgrown crystalline portion 128 can have a width W_(in)of 100 nanometers or larger, 500 nanometers or larger, 1 micron orlarger, 2 microns or larger, 5 microns or larger, 10 microns or larger,or 20 microns or larger, and more preferably, from 2 to 5 microns. Asemiconductor device or an element of a semiconductor device with adesired large size (e.g. 100 nanometers or larger, 500 nanometers orlarger, 1 micron or larger, 2 microns or larger, 5 microns or larger, 10microns or larger, or 20 microns or larger, and more preferably, from 2to 5 microns) can thus be formed at or in the overgrown crystallineportion 128.

The openings formed in a substrate by using trenches, recesses, openingsor the like as described above can have any desired shapes or layouts,an exemplary of which is diagrammatically illustrated in a top view inFIG. 4. Referring to FIG. 4, an opening can have other shapes such as a90° angle shape, such as opening 130. Of course, an opening can haveother shapes, such as circular, donut, polygonal, and many otherpossible shapes. Multiple openings can be formed in the opening with anydesired layouts. For example, rectangular openings 134 and 132 can beperpendicular or parallel or can be arranged to have any desired anglestherebetween.

Exemplary methods as described above with reference to FIG. 1 a throughFIG. 1 d or FIG. 2 can enable integration of non-silicon semiconductordevices into a silicon process. For demonstration purposes, FIG. 5diagrammatically illustrates one of the examples. Referring to FIG. 5,openings are formed by using a STI process in silicon substrate 100.Germanium (or InGaAs or other semiconductor materials such as a III-Vgroup semiconductor material) ART crystalline structures 138 and 140 areformed in the STI openings in silicon substrate 100. Germanium based (orInGaAs or other semiconductor materials such as a III-V groupsemiconductor material based) semiconductor devices 146 and 150, such asphotodetectors are formed at ART structures 138 and 140. A buffer layer(e.g., 10-100 nm) can be between the substrate 100 and the ARTcrystalline structures 138 and 140 for bonding, adhesion or improveddevice characteristics purposes. Silicon based devices or elements ofsemiconductor devices 144, 148 and 152 are formed at the patterns ofsubstrate 100 using standard silicon processes, such as CMOS processes.As such, non-silicon semiconductor devices of elements of non-siliconbased semiconductor devices are integrated (e.g., co-planar) in thesilicon process.

In examples of forming ART epitaxial structures in STI trenches that areformed in a substrate, such as a silicon substrate, the substratepatterns, such as the silicon patterns around the openings, can betreated. For example, the substrate patterns can be intentionallypassivated for protecting the substrate patterns and the ART structures.This can be of great importance when the thermal and/or mechanicalproperties of the substrate and the ART structures mismatch, which maycause physical and/or chemical damages to the ART structures and/or tothe substrate patterns due to the mismatch. For example, physicaldamages may occur to the ART structures and/or the substrate patternswhen the CTE (coefficient-of-thermal-expansion) of the ART structuresand the substrate patterns do not match. In one example, the substratepatterns can be passivated by oxidization or nitridization so as to forma protection layers on the exposed surfaces of the substrate patterns orthe interfaces between the substrate patterns and the ART structures.

As an exemplary implementation of the method and the structure asdescribed above with reference to FIG. 2, an exemplary structure havinga p-i-n structure formed in an ART epitaxial crystalline structure isdiagrammatically illustrated in FIG. 6. Referring to FIG. 6, STI trench107 is formed in semiconductor substrate 100, which can be a siliconsubstrate or other semiconductor substrates. Isolation patterns 154 and155 are formed within the STI trench (107) and define opening 157therebetween. Opening 157 can have a height that is substantially equalto or larger than the critical height under which the ART crystallinestructure formed in the opening 157 has dislocation defects and abovewhich the ART crystalline structure is substantially free fromdislocation defects. An ART epitaxial crystalline structure can be grownin opening 157. By overgrowing the ART structure in opening 157, a largeART overgrown portion 156 is obtained.

A p-i-n structure having p-type region 158, intrinsic region 160, andn-region 162 is formed in overgrown crystalline portion 156. The p-typeregion 158 and the n-type region 162 can be obtained by doping. Becausethe overgrown crystalline portion 160 can have a large size, such as 100nanometers or larger, 500 nanometers or larger, 1 micron or larger, 2microns or larger, 5 microns or larger, 10 microns or larger, or 20microns or larger, and more preferably, from 2 to 5 microns, theintrinsic i region 160 can be large, such as 100 nanometers or larger,500 nanometers or larger, 1 micron or larger, 2 microns or larger, 5microns or larger, 10 microns or larger, and more preferably, from 2 to5 microns.

Other circuitry can be formed on the patterned semiconductor substrate100, such as the transistor having source 164, gate 166, and drain 168,the transistor having source 170, gate 172, and drain 174, and thetransistor having source 178, gate 180, and drain 182. The source, gate,and drain of a transistor can be formed by a standard silicon process,such as a CMOS process. For example, the sources and drains of thetransistors can be formed by doping; and the gates of the transistorscan be formed by a standard silicon based lithography process. Otherfeatures can also be formed in the substrate 100. For example, isolationunit 176 can be formed between transistors so as to isolating thetransistors. In one example, the semiconductor device (e.g. 156) formedon the ART structure can be substantially coplanar with one or moreother semiconductor devices (e.g. transistors) on substrate 100. Forexample, the top surfaces of 158, 160, and 162 of device 156 can be madesubstantially coplanar with the transistors formed on substrate 100.

As an exemplary implementation of the method and the structure asdescribed above with reference to FIG. 3, an exemplary structure havinga p-i-n structure formed in an ART epitaxial crystalline structure isdiagrammatically illustrated in FIG. 7. Referring to FIG. 7, STI trench109 is formed in semiconductor substrate 100, which can be a siliconsubstrate or other semiconductor substrates. Multiple isolationpatterns, such as dielectric pattern 154 are formed within the STItrench 109 using for example the method as described above withreference to FIG. 3, which will not be repeated herein. Openings 184,186, and 188 are defined by the isolation patterns.

ART epitaxial crystalline growth can be performed in the openings 184,186, and 188. By overgrowing or through the combination of overgrowingand coalescing of ELO portions of the ART structures in openings 184,186, and 188, overgrown crystalline portion 196 is obtained. Theovergrown crystalline portion 196 can have a large dimension, such as alateral and/or vertical dimensions of 100 nanometers or larger, 500nanometers or larger, 1 micron or larger, 2 microns or larger, 5 micronsor larger, 10 microns or larger, and preferably, from 2 to 5 microns.

A p-i-n structure having p-type region 192, intrinsic region 190, andn-region 194 is formed in overgrown crystalline portion 196. The p-typeregion 192 and the n-type region 194 can be obtained by doping. Becausethe overgrown crystalline portion 196 can have a large size, theintrinsic i region 190 can be large, such as 100 nanometers or larger,500 nanometers or larger, 1 micron or larger, 2 microns or larger, 5microns or larger, 10 microns or larger, and more preferably from 100nanometers to 200 microns, and preferably, from 2 to 5 microns.

Other circuitry can be formed on the patterned semiconductor substrate100, such as the transistor having source 164, gate 166, and drain 168.The source, gate, and drain of a transistor can be formed by a standardsilicon process, such as a CMOS process. For example, the sources anddrains of the transistors can be formed by doping; and the gates of thetransistors can be formed by a standard silicon based lithographyprocess. Other features can also be formed in the substrate 100. Forexample, isolation unit 176 can be formed between transistors so as toisolating the transistors. In one example, the semiconductor device(e.g. 196) formed on the ART structure can be substantially coplanarwith one or more other semiconductor devices (e.g. transistors) onsubstrate 100. For example, the top surfaces of 192, 190, and 194 ofdevice 196 can be made substantially coplanar with the transistorsformed on substrate 100.

As can be seen in the examples as illustrated in FIG. 6 and FIG. 7,lateral p-i-n structures or p-n junctions can be made in ART epitaxialcrystalline semiconductor structures, wherein the semiconductorstructures can be comprised of non-silicon materials. For example, thecarrier channel from the p region to the n region of a lateral p-i-n orp-n junction is parallel to the major surface of the substrate 100 or issubstantially perpendicular to the direction along which the ARTepitaxial crystalline materials are formed.

The method of making a semiconductor device can be of great importancein making photodetector pixels that are comprised of an array of p-i-nstructures. For demonstration purposes, FIG. 8 through FIG. 14diagrammatically demonstrate a portion of an array of photodetectorpixels that are formed by exemplary methods as described above. Inparticular, non-silicon semiconductor devices (e.g. non-siliconsemiconductor sensor 214) can be integrated with silicon semiconductordevices (e.g. silicon transistors 208, 209, 202, and 204) using themethod as discussed above. Referring to FIG. 8, four photodetectorpixels of the photodetector array are shown for simplicity purposes. Ingeneral, the photodetector array may comprise any desired number ofphotodetector pixels, which is referred to as the native resolution ofthe photodetector array. In one example, the photodetector array mayhave a native resolution of 640×480 (VGA) or higher, such as 800×600(SVGA) or higher, 1024×768 (XGA) or higher, 1280×1024 (SXGA) or higher,1280×720 or higher, 1400×1050 or higher, 1600×1200 (UXGA) or higher, and1920×1080 or higher, or integer multiples and fractions of theseresolutions. Of course, other resolutions are also applicable dependingupon specific applications.

Each photodetector can have a characteristic size of less than 500nanometers, 500 nanometers or larger, 1 micron or larger, such as 1.5microns or larger, 2 microns or larger, 5 microns or larger, 10 micronsor larger, or from 5 to 10 microns. The pitch, which is referred to asthe distance between adjacent photodetectors in the array, can be anysuitable values, such as 500 nanometers or larger, 1 micron or larger,such as 1.5 microns or larger, 2 microns or larger, 5 microns or larger,10 microns or larger, or from 5 to 10 microns.

The portion of the exemplary photodetector array 200 comprisestransistors 202, 204, 206, 208, 209, 210, 212, 218, 220, 224, 226, 230,and 232, and photo-sensors 214, 216, 222, and 228. The photo-sensorsconvert the light energy into voltage signals, and a group oftransistors amplify the voltage signals (and convert the amplifiedvoltage signals into digital signals if necessary). Another group oftransistors can be provided for addressing and reading out the outputsof individual photodetector pixels in the columns and rows of the arrayby column and row addressing/reading signals.

For example, sensor 214 converts the received light intensity into avoltage signal. When an active signal (column signal) is delivered totransistor 209 through transistor 204 from a column decoder (which notshown in the figure), the output voltage signal from sensor 214 isamplified by transistor 208. When a row signal (row active signal) isdelivered to the gate of transistor 209 through transistor 230, theamplified voltage signal V_(DD) is read out through the output oftransistor 208. The output voltage signal V_(DD) can be digitized byother devices, such as an ADC unit, which is not shown in the figure.

The sensors 214, 216, 222, and 228 each can be a p-i-n structure asdiagrammatically illustrated in FIG. 9. Referring to FIG. 9, sensor 214comprises p region 234, i region 236, and n region 238. The p-i-nstructure 214 can be formed in many ways, such as those described abovewith reference to FIG. 5, FIG. 6, and FIG. 7. Electron transportationsproperties of the p-i-n structure can be interpreted by energy banddiagrams as diagrammatically illustrated in FIG. 9 and FIG. 10.

Referring to FIG. 9, the conductive and covalence bands of the p region234, i region 236, and n region 238 are substantially flat in theabsence of external voltages. Fermi energy E_(f) is close to thecovalence band of the p region such that the p region is a hole-richregion. Because the i region is an intrinsic semiconductor region, theFermi energy E_(f) is around the center of the gap between the covalenceand conductive bands. Fermi energy E_(f) is close to the conductive bandof the n region such that the n region is an electron-rich region.

In the presence of external voltage V+ and V− respectively applied tothe n and p regions, as diagrammatically illustrated in FIG. 10, theconductive and covalence bands of the p region is elevated; while theconductive and covalence bands of the n region is declined. As aconsequence, the conductive and covalence bands of the intermediate iregion inclines. The Fermi energy E_(f) also inclines the energy gap ofthe i region. The inclined Fermi energy drives electrons in the i regiontowards the n region; and holes in the i region toward the p region.This transportation of electrons and holes forms current in a carrierchannel connecting the p and n regions.

The transistors and sensors of the photodetectors illustrated in FIG. 8can be formed on ART epitaxial crystalline structures, which can bebetter illustrated in FIG. 11. For simplicity purposes, sensor 214 andthe transistors around sensor 214 are shown in FIG. 11. The exemplaryconnection of sensor 214 to the transistors is also applicable to othersensors and transistors.

Referring to FIG. 11, sensor 214 has p, i, and n regions; and sensor 214can be a non-silicon semiconductor device. The transistors 202, 204,208, and 209 can be silicon based transistors. The p region is groundedand is connected to the drain of transistor 202. The source oftransistor 202 is connected to reset signal p region V_(RST). The pregion of sensor 214 is connected to the gate of transistor 208. Thesource of transistor 208 acts as an output for outputting amplifiedvoltage signal V_(DD). The drain of transistor 208 is connected to thesource of transistor 209. The gate of transistor 209 is connected to thesource of row selection transistor 230, whose gate is connected to therow signal from a row decoder. The drain of transistor 230 is connectedto amplified voltage signal V_(DD).

The drain of transistor 209 is connected to the source of columnselection transistor 204, whose gate is connected to the column signalfrom a column decoder. The drain of row selection transistor 204 isconnected to a sense signal.

The transistors in FIG. 11 can have any suitable configurations. Inparticular, the non-silicon semiconductor sensor 214 can be integratedwith the silicon-based transistors (e.g. 202, 208, 209, 204, and 230).Alternatively, the transistors such as transistor 202 can be other typesof transistors, such as germanium (or other silicon or non-silicon)based transistors as diagrammatically illustrated in FIG. 12. Referringto FIG. 12, a trench 235 or an opening is formed in a silicon substrate.The sidewalls of the trench are covered with a dielectric layer, such asan oxide layer 243. The sidewall cover layer 243 can be formed in manyways. For example, the sidewall cover layer 243 can be formed bydepositing or growing the sidewall cover layer in the trench followed byremoving the cover layer on the bottom surface of the trench.Alternatively, the trench can be filled with the sidewall cover layerfollowed by patterning/etching to form the desired sidewall cover layerin the trench. A germanium (or other silicon or non-siliconsemiconductor materials) epitaxial crystalline structure 234 is formedin the trench of the silicon substrate using, for example, the method asdiscussed above with reference to FIG. 6. Source 236 and drain 238 ofthe transistor are formed in the germanium epitaxial crystallinestructure 234 by doping. Gate 241 is formed on the germanium crystallinestructure with an oxide layer laminated therebetween.

Another exemplary configuration of the transistors in FIG. 11 isdiagrammatically illustrated in FIG. 13. Referring to FIG. 13, thetransistor is formed on a silicon substrate. Dielectric patterns 242 areformed so as to define an opening on the silicon substrate. Thedielectric patterns can be formed by depositing a layer of a selecteddielectric material, such as TiN_(x) on the silicon substrate followedby patterning the deposited dielectric layer.

The opening defined by the dielectric patterns has an appropriate aspectratio, such as 0.5 or larger, 1 or larger, 1.5 or larger or 3 or larger,such that an ART growth process can be performed within the opening.Germanium epitaxial crystalline structure 148 can then be formed in theopening through an ART process. By doping portions of the germaniumcrystalline structure, source 236 and drain 238 can be obtained with anintrinsic region being laminated therebetween. Gate 241 can be formedabove the germanium epitaxial crystalline structure with an oxide layerdisposed therebetween.

In examples wherein the sensors of the photodetectors illustrated inFIG. 11 desired large areas, such as 1 micron or larger, 2 microns orlarger, 5 microns or larger, 10 microns or larger, or from 5 to 10microns, the p-i-n structure of the sensor can be formed using methodsas described above with reference to FIG. 1, FIG. 2 or FIG. 7 or thelike. For demonstration purposes, FIG. 14 diagrammatically illustratesan exemplary electrical connection of the p-i-n structure of the sensorto a transistor. This connection scheme is also applicable toconnections of other sensors and transistors.

Referring to FIG. 14, an array of STI process trench structures (orother types of trench structures) 244, 246, 248, 250, and 252 are formedin a silicon substrate. The STI process trench structures can be formedby multiple patterning processes. For example, a patterning process canbe performed so as to define the STI process opening from the topsurface of the silicon substrate to the top surfaces of STI processpatterns 214 and 254. Within the defined opening, another patterningprocess can be performed so as to define STI process patterns 244, 246,248, 250, and 252 within the previously defined opening 214.

The adjacent STI patterns of the array of STI patterns 244, 246, 248,250, and 252 define a series of openings, each of which has an aspectratio commensurate with the aspect-ratio(s) desired for the followingART processes. With the series of openings between STI patterns 244,246, 248, 250, and 252, an ART process is performed using a germanium(or other semiconductor materials, such as InGaAs and III-V groupmaterials) so as to form an ART epitaxial crystalline structure. Asdescribed above with reference to FIG. 1 d or FIG. 7, a large ARTportion can be formed above the openings and STI patterns by overgrowingthe ART structures or by coalescing the ELO portions of the adjacent ARTstructures. Regardless of the growing process, the ART portion 264 canhave the top surface that is substantially coplanar to the substrate(e.g. the silicon substrate) or can be above the top surface of thesilicon substrate. Accordingly, the semiconductor device (or structure)formed on the ART structure (e.g. 264) can be substantially coplanar toanother semiconductor device (e.g. the transistor having source 256,gate 258, and drain 260) formed at the top surface of the substrate. Thep-i-n structures can then be formed in the large ART portion.Specifically, the p and n regions can be obtained by doping theintrinsic large ART portion with appropriate dopants. The intrinsic iregion can have a large size, such as 1 micron or larger, 1.5 microns orlarger, 2 microns or larger, 5 microns or larger, 10 microns or larger,or from 5 to 10 microns.

An insulation structure 254 can be formed by a STI process. Transistorshaving source 256, drain 260, and gate 258 can be formed on the siliconsubstrate by using a standard silicon process, such as a CMOS process.The p region of the p-i-n structure of the sensor 214 is grounded. The nregion of the p-i-n structure is connected to the gate of transistor208.

Other than forming a semiconductor device, such as a photodetector, atransistor, a LED or a laser, on a dislocation-free region in anepitaxial crystalline ART structure, the semiconductor device canalternatively be formed on a coalesced region between adjacent ARTstructures, an example of which is diagrammatically illustrated in FIG.15. Referring to FIG. 15, substrate 269, which can be a semiconductorsubstrate, such as a silicon substrate is provided. Dielectric layer 270is deposited on the substrate followed by patterning so as to generateopenings in the dielectric layer. An ART process can be performed toform ART epitaxial crystalline structures 280 and 282. By overgrowingthe ART structures, the ELO portions of the adjacent ART structures 280and 282 can be coalesced to form a coalesced region 272. Semiconductordevice 276, such as a p-i-n structure or p-n junction, a transistor, orother semiconductor devices can be formed at or in the coalesced region272. Element 276 can alternatively be a member of semiconductor device274 that further comprises member 278, which can be formed at thenon-coalesced ART region, such as the non-coalesced region of ARTstructure 280.

Alternative to forming semiconductor devices on coalesced region ofadjacent ART structures that are formed in openings defined bydielectric patterns as described above with reference to FIG. 15, asemiconductor device can be formed at or in a coalesced region ofadjacent ART structures that are formed in substrates, trenches, STItrenches or openings, an example of which is diagrammaticallyillustrated in FIG. 16.

Referring to FIG. 16, ART epitaxial crystalline structures 286 and 288are formed from STI trenches in substrate 269, which can be asemiconductor substrate, such as a silicon substrate, wherein thesidewalls of the trenches are covered by dielectric layers 271 and 273,which may be comprised of an oxide material or other suitable materials.The dielectric layer can be formed in the same way as the dielectriclayer 243 in FIG. 12. The ELO portions of ART structures 286 and 288coalesce resulting in coalesced region 290. Semiconductor device 294,such as a p-i-n or p-n junction, a transistor, or other semiconductordevices can be formed at or in the coalesced region 290. Element 294 canalternatively be a member of semiconductor device 292 that furthercomprises member 296, which can be formed at the non-coalesced ARTregion, such as the non-coalesced region of ART structure 286.

In addition to the methods described above, integration of a non-siliconbased semiconductor device into a silicon process can alternatively beachieved by using buffer layers. Graded buffer layers can be of greatvalue for heteroepitaxy growth, such as heteroepitaxy growth on silicon.As a way of example, graded buffer layers can be used for heteroepitaxy(e.g. in silicon) in relatively larger areas as compared to the narrowtrench areas (e.g. STI trench structures as in examples of ART). FIG. 17diagrammatically illustrates an example. Referring to FIG. 17, in orderto form a non-silicon based semiconductor device, such as a germanium(or other semiconductor materials, such as InGaAs and III-V groupsemiconductor materials) semiconductor device (e.g. a p-n or p-i-nstructure) on a silicon substrate, a graded buffer layer comprised of aselected semiconductor material is deposited on the silicon substrate.The graded buffer layer may have a size (e.g. the lateral or verticaldimension) such as 100 nanometers or larger, 500 nanometers or larger, 1micron or larger, 2 microns or larger, 5 microns or larger, 10 micronsor larger, or 100 microns or larger, 1 millimeter or larger, 200millimeters or larger, 500 millimeters or larger, 1 centimeter orlarger, or from 10 microns to several centimeters, such as from 10microns to 500 microns, from 10 microns to 1 millimeter, from 10 micronsto 500 millimeters or from 10 microns to 1 centimeter. The graded bufferlayer may have other suitable lateral/vertical dimensions in otherexamples. In the particular example as illustrated in FIG. 17,dielectric patterns 302 of a selected dielectric material, such asTiN_(x) are formed on silicon substrate 304 and define an opening. Inorder to form a germanium p-n diode on the silicon substrate 304, gradedbuffer layer 298 for germanium is deposited in the opening on thesilicon substrate 304. In other examples, the buffer can be comprised ofother suitable materials, such as GaAs, a III-V group semiconductormaterial (e.g. SiGe, InGaAs, and InP), or a laminate of GaAs/InP/InGaAs.The graded buffer layer can be formed in many ways such as epitaxialtechniques and other suitable techniques.

Germanium p-n diode 300 can then be formed on the graded buffer layer298 for germanium. It is noted that depending upon differentsemiconductor devices to be formed on the silicon substrate 304, thegraded buffer layer can be comprised of different materials to match thesemiconductor device to be formed thereon.

The graded buffer layer can also be used for making semiconductordevices in trenches such as STI trenches formed in a semiconductorsubstrate, as diagrammatically illustrated in FIG. 18. Referring to FIG.18, a STI trench is formed in silicon substrate 304. The sidewalls ofthe trench are covered by dielectric layer 299, which can be comprisedof an oxide material or other suitable materials. The dielectric layercan be formed in the same way as the dielectric layer 243 in FIG. 12. Agraded buffer layer 298 is disposed in the STI trench. Depending uponthe semiconductor device to be formed on the buffer layer and thesilicon substrate, the graded buffer layer can be comprised differentmaterials. In the example as illustrated in FIG. 18 wherein a germaniump-n diode is to be formed, the graded buffer layer is correspondinglycomprised of a material for matching germanium. Germanium p-n diode 300is formed on buffer layer 298.

A graded buffer layer may itself comprise a substantially defect (e.g.dislocation defect) free layer; and a device layer for forming asemiconductor device (e.g. a transistor, a photodetector, a solar cell,or other devices) can be formed on such defect free layer. The gradedbuffer layer may have a size (e.g. the lateral or vertical dimension)such as 100 nanometers or larger, 500 nanometers or larger, 1 micron orlarger, 2 microns or larger, 5 microns or larger, 10 microns or larger,or 100 microns or larger, 1 millimeter or larger, 200 millimeters orlarger, 500 millimeters or larger, 1 centimeter or larger, or from 10microns to several centimeters, such as from 10 microns to 500 microns,from 10 microns to 1 millimeter, from 10 microns to 500 millimeters orfrom 10 microns to 1 centimeter. The graded buffer layer may have othersuitable lateral/vertical dimensions in other examples. The gradedbuffer layer can be formed on a substrate (e.g. a silicon substrate), orin a region, such as a trench (e.g. a STI trench or other typestrenches) that is formed in a substrate or in a dielectric or insulatorlayer above a substrate.

Referring to FIG. 19 a, a cross-sectional view of a portion of anexemplary array of photodetectors is diagrammatically illustratedtherein. A heavily doped p+ region is formed in a silicon substrate. Thep+ region can then be used as a lower contact for the photodetectors. Adielectric layer, which is comprised of a low-temperature-oxide (LTO)material in this example, is deposited on the silicon substrate (e.g. onthe p+ region in the silicon substrate). The deposited LTO layer ispatterned so as to form openings and expose the silicon substrate,especially, the p+ region in the silicon substrate. ART epitaxialcrystalline structures of a selected material, such as germanium or aIII-V group semiconductor material are formed in the openings. The ARTstructures can be grown with in-situ doping until past the defectregions. The in-situ doped defect-regions can be formed as p-typeregions. The ART process can continue until the thickness (e.g. L) issufficient to allow for desirable levels of absorption of incident lightthat the photodetector is designed for detecting, such as visible light,ultraviolet light, and/or infrared light. The top portion of the ARTstructures can then be doped with an appropriate material so as to formn-type regions.

A top view of the photodetectors in FIG. 19 a is diagrammaticallyillustrated in FIG. 19 b. Referring to FIG. 19 b, three photodetectorsare shown for simplicity and demonstration purposes. As discussed above,the photodetector array may comprise any desired number ofphotodetectors.

The photodetectors in FIGS. 19 a and 19 b are configured such that thep, i, and n regions of each photo sensor (e.g. the p-i-n structures) arevertically aligned along the growth direction of the ART structures. Inphoto detection application, light to be detected is directed toward thetop of the sensors. In an alternative example, the light to be detectedcan be directed along the side of the sensors, as diagrammaticallyillustrated in FIG. 20 a.

Referring to FIG. 20 a, a heavily doped p+ region is formed in anintrinsic silicon substrate. An ART epitaxial crystalline materialcomprised of germanium or a III-V semiconductor material is grown inopenings of a dielectric layer, such as the dielectric layer comprisedof a LTO material in FIG. 19 a. With in-situ implantation, p region canbe formed in the ART structures, especially the defect regions of theART structures. The ART structures continue to form the intrinsicregions. By in-situ or other doping techniques, n-regions can be formedin the top regions of the ART structures. A metal contact then can beformed on and physically contact to the n-regions.

In light detection application, light to be detected is directed fromthe side of the photodetector as diagrammatically illustrated in FIG. 20a. This configuration allows for light detection to occur in-plane withthe silicon substrate. Furthermore, it allows for the growth thicknessof ART structures to be independent from the absorption depth.

A top view of the photodetectors is diagrammatically illustrated in FIG.20 b. Referring to FIG. 20 b, germanium (or other semiconductormaterials, such as a III-V semiconductor material) epitaxial crystallineART structures are formed on a substrate (e.g. on the heavily doped p+region formed in the silicon substrate). The germanium ART structures inthis example are deployed such that the lengths (in the top view) of thegermanium ART structures are aligned to the <110> direction of thesilicon substrate, however the application is not intended to be solimited as other alignments are considered available. The incident lightto be detected is directed toward the side of the germanium ARTstructures.

The electrical connection of the photodetectors as illustrated in FIG.20 a and FIG. 20 b can have many suitable configurations, one of whichis diagrammatically illustrated in FIG. 21 a and FIG. 21 b. Referring toFIG. 21 a, the exemplary electrical connection scheme is illustrated ina top view. A contact to n region and a contact to p region areprovided. Each contact comprise at least an elongated contact beam thatspans across and electrically connected to substantially all regions ofa particular type (e.g. the n or the p type) of the photodetectors. Forexample, metal contact 310 for contacting to n regions comprises contactbeam 312. Contact beam 312 spans across substantially all ARTstructures; and is connected to the n regions of the ART structures.This connection is better illustrated in FIG. 21 b that diagrammaticallyillustrates the connection of the metal contacts to the p and n regionsof a p-i-n structure in a photodetector.

Metal contact 314 comprises at least one contact beam, such as contactbeam 316. The contact beam spans across substantially allphotodetectors; and is electrically connected to the p regions of thephotodetectors. This connection is better illustrated in FIG. 21 b.

In order to improve the quality and reliability of the electricalconnection between the metal contacts to their designated regions, eachcontact may comprise multiple contact beams as diagrammaticallyillustrated in FIG. 21 a. In the example as illustrated in FIG. 21 a,the contact beams of each metal contact are uniformly deployed acrossthe photodetectors within the light absorption range L. Contact beams ofdifferent contacts can be alternately disposed. Other configurations arealso applicable. For example, multiple (e.g. 2 or more) contact beams ofone metal contact can be disposed between two adjacent contact beams ofthe other contact.

In another exemplary configuration, a contact beam of a metal contactcan be connected to a group of photodetectors but not allphotodetectors. The photodetectors not electrically connected to onecontact beam can be electrically connected to another contact beam. Inother words, a metal contact can have at least two contact beams thatare electrically connected to two different groups of photodetectors;whereas the two different groups have at least one differentphotodetector.

The method as described above can be applied to make semiconductordevices formed in or at ART structures, wherein the defect regions ofthe ART structures are not electrically isolated from rest of thesemiconductor device. As a way of example, FIG. 22 diagrammaticallyillustrates a cross-sectional view of an exemplary photodetector havingan n-p-n junction formed in an ART structure.

Referring to FIG. 22, a non-silicon ART material, which is a germanium(or III-V semiconductor material) in this example, is grown within anopening on a silicon substrate. The opening can be formed frompatterning of a dielectric layer deposited on the silicon substrate orcan be a STI trench formed in the silicon trench.

The germanium ART structure has a defect region, such as a regioncomprising dislocation defects, at the bottom. The n and p regions canbe formed at the dislocation-defect-free top portion of the germaniumART structure. Specifically, an n-p-n junction can be formed near thetop surface of the germanium ART structure. In this example, the bottomdefect region in the germanium ART structure is not electricallyisolated from the n-p-n junction or the germanium intrinsic region.Light to be detected is directed from the side of the photodetector.

It is noted that the semiconductor devices, such as the photodectors asdiscussed above with reference to FIG. 19 a through FIG. 22 can beformed in trench structures, such as STI trenches or other types oftrenches. The trenches can be formed in a substrate (e.g. withdielectric layers on the sidewalls of the trenches when necessary) orcan be formed in a dielectric (or insulator) layer over the substrate.

As noted above, teachings of this disclosure have a wide variety ofapplications. While not limited to ART technology, teachings of thisdisclosure have many applications within ART technology. For example,examples of the methods disclosed in this disclosure may be used tocreate photodetectors (e.g., IR, UV) for semiconductor devices. Further,examples of the methods disclosed in this disclosure may be used tocreate sensors using a p-n junction or a p-i-n structure in the sensingregion (e.g., IR, UV) for semiconductor devices. A wide variety ofdevices may incorporate the invention. While not limiting to thesedevices, the invention may be particularly applicable to mixed signalapplications, field effect transistors, quantum tunneling devices, lightemitting diodes, laser diodes, resonant tunneling diodes andphotovoltaic devices, especially those using ART technology. ApplicationSer. No. 11/857,047 filed Sep. 18, 2007 entitled “Aspect Ratio Trappingfor Mixed Signal Applications”; application Ser. No. 11/861,931 filedSep. 26, 2007 entitled “Tri-Gate Field-Effect Transistors formed byAspect Ratio Trapping”; application Ser. No. 11/862,850 filed Sep. 27,2007 entitled “Quantum Tunneling Devices and Circuits withLattice-mismatched Semiconductor Structures”; application Ser. No.11/875,381 filed Oct. 19, 2007 entitled “Light-Emitter—Based Deviceswith Lattice-mismatched Semiconductor Structures”; and application Ser.No. 12/100,131 filed Apr. 9, 2007 entitled “Photovoltaics on Silicon”are all hereby incorporated by reference as providing examples to whichaspects of this invention may be particularly suited.

A silicon CMOS device may be processed prior to embodiments of theinvention, therefore, embodiment of devices such as LEDs or photovoltaicdevices according to the invention integrated with CMOS process may befabricated. Further, structures and/or methods according to disclosedembodiments can be used for integration of non-Si channel or activeregions for next generation CMOS and for a wide variety of otherapplications.

Any reference in this specification to “one embodiment,” “anembodiment,” “example embodiment,” “example,” etc., means that aparticular feature, structure, or characteristic described in connectionwith the embodiment is included in at least one embodiment of theinvention. The appearances of such phrases in various places in thespecification are not necessarily all referring to the same embodiment.Further, when a particular feature, structure, or characteristic isdescribed in connection with any embodiment, it is submitted that it iswithin the purview of one skilled in the art to affect such feature,structure, or characteristic in connection with other ones of theembodiments. Furthermore, for ease of understanding, certain methodprocedures may have been delineated as separate procedures; however,these separately delineated procedures should not be construed asnecessarily order dependent in their performance. That is, someprocedures may be able to be performed in an alternative ordering,simultaneously, etc. In addition, exemplary diagrams illustrate variousmethods in accordance with embodiments of the present disclosure. Suchexemplary method embodiments are described herein using and can beapplied to corresponding apparatus embodiments, however, the methodembodiments are not intended to be limited thereby.

Although few embodiments of the present invention have been illustratedand described, it would be appreciated by those skilled in the art thatchanges may be made in these embodiments without departing from theprinciples and spirit of the invention. The foregoing embodiments aretherefore to be considered in all respects illustrative rather thanlimiting on the invention described herein. Scope of the invention isthus indicated by the appended claims rather than by the foregoingdescription, and all changes which come within the meaning and range ofequivalency of the claims are intended to be embraced therein. As usedin this disclosure, the term “preferably” is non-exclusive and means“preferably, but not limited to.” Terms in the claims should be giventheir broadest interpretation consistent with the general inventiveconcept as set forth in this description. For example, the terms“coupled” and “connect” (and derivations thereof) are used to connoteboth direct and indirect connections/couplings. As another example,“having” and “including”, derivatives thereof and similar transitionalterms or phrases are used synonymously with “comprising” (i.e., all areconsidered “open ended” terms)—only the phrases “consisting of” and“consisting essentially of” should be considered as “close ended”.Claims are not intended to be interpreted under 112 sixth paragraphunless the phrase “means for” and an associated function appear in aclaim and the claim fails to recite sufficient structure to perform suchfunction.

What is claimed is:
 1. A circuit structure comprising: a transistordisposed in a substrate, the substrate comprising a first crystallinesemiconductor material, the transistor comprising a first source/drainregion disposed in the first crystalline semiconductor material and agate structure disposed on the first crystalline semiconductor material;and a photo-sensor disposed in a second crystalline semiconductormaterial, the second crystalline semiconductor material being latticemismatched to the first crystalline semiconductor material, the secondcrystalline semiconductor material being disposed at least partially ina recess of the first crystalline semiconductor material, thephoto-sensor being electrically coupled to the gate structure of thetransistor.
 2. The circuit structure of claim 1, wherein the recess ofthe first crystalline semiconductor material has a dielectric materialalong sidewalls of the recess.
 3. The circuit structure of claim 1,wherein a dielectric material is disposed along a bottom surface of therecess of the first crystalline semiconductor material, an opening beingdefined through the dielectric material to the bottom surface of therecess, the second crystalline semiconductor material being disposed atleast partially in the opening.
 4. The circuit structure of claim 1,wherein a dielectric material is disposed along a bottom surface of therecess of the first crystalline semiconductor material, a plurality ofopenings being defined through the dielectric material to the bottomsurface of the recess, the second crystalline semiconductor materialbeing disposed at least partially in each of the plurality of openings.5. The circuit structure of claim 1, wherein the second crystallinesemiconductor material comprises defects arising from lattice-mismatchto the first crystalline semiconductor material, the defects beingtrapped at sidewalls of the recess.
 6. The circuit structure of claim 1further comprising a graded buffer material disposed in the recess ofthe first crystalline semiconductor material, the second crystallinesemiconductor material being disposed on the graded buffer material. 7.The circuit structure of claim 1, wherein the photo-sensor comprises ap-i-n structure in the second crystalline semiconductor material.
 8. Asensor structure comprising: a sensor array comprising a plurality ofcells, each cell comprising: a cell region on a substrate, the cellregion comprising a first crystalline semiconductor material and asecond crystalline semiconductor material, the first crystallinesemiconductor material being lattice mismatched to the secondcrystalline semiconductor material, a first transistor comprising afirst source/drain region disposed in the first crystallinesemiconductor material, and a photo-sensor disposed in the secondcrystalline semiconductor material, the first transistor beingelectrically coupled to the photo-sensor.
 9. The sensor structure ofclaim 8, wherein the substrate comprises the first crystallinesemiconductor material, the second crystalline semiconductor materialbeing disposed at least partially in a recess in the first crystallinesemiconductor material.
 10. The sensor structure of claim 9, wherein thesecond crystalline semiconductor material adjoins the first crystallinesemiconductor material, the second crystalline semiconductor materialcomprising defects arising from lattice-mismatch to the firstcrystalline semiconductor material, the defects being trapped atsidewalls of the recess.
 11. The sensor structure of claim 9 furthercomprising a graded buffer material disposed in the recess of the firstcrystalline semiconductor material, the second crystalline semiconductormaterial being disposed on the graded buffer material.
 12. The sensorstructure of claim 8, wherein a top surface of the first crystallinesemiconductor material is co-planar with a top surface of the secondcrystalline semiconductor material.
 13. The sensor structure of claim 8further comprising a second transistor having a second source/drainregion disposed in a third crystalline semiconductor material, the firstcrystalline semiconductor material being lattice mismatched to the thirdcrystalline semiconductor material.
 14. The sensor structure of claim 8,wherein each cell further comprises a second transistor, the firsttransistor comprising a first gate, the first source/drain region, and asecond source/drain region, the second transistor comprising a secondgate, a third source/drain region, and a fourth source/drain region, thefirst gate being coupled to the photo-sensor, the second gate beingcoupled to a row-select node, the first source/drain region beingcoupled to a power supply node, the second source/drain region beingcoupled to the third source/drain region, and the fourth source/drainregion being coupled to a column-select/sense node.
 15. The sensorstructure of claim 8 further comprising: column-select transistors, eachcolumn of the plurality of cells having a respective column-selecttransistor; and row-select transistors, each row of the plurality ofcells having a respective row-select transistor.
 16. A structurecomprising: a trench comprising dielectric sidewalls and a crystallinebottom surface, the crystalline bottom surface comprising a firstcrystalline semiconductor material; a second crystalline semiconductormaterial disposed at least partially in the trench, the secondcrystalline semiconductor material having a defect region proximate aninterface between the first crystalline semiconductor material and thesecond crystalline semiconductor material, the defect region comprisingdislocation defects arising from a lattice mismatch between the firstcrystalline semiconductor material and the second crystallinesemiconductor material, the dislocation defects terminating at thedielectric sidewalls, the second crystalline semiconductor materialhaving a dislocation defect-free region substantially free fromdislocation defects and distal from the interface between the firstcrystalline semiconductor material and the second crystallinesemiconductor material; and a photo-sensor disposed in the secondcrystalline semiconductor material, the photo-sensor having a p-dopedregion, an intrinsic region, and a n-doped region.
 17. The structure ofclaim 16, wherein the p-doped region and the n-doped region are disposedin the dislocation defect-free region of the second crystallinesemiconductor material, the p-doped region being disposed at a surfaceof the second crystalline semiconductor material distal from theinterface, the n-doped region being disposed at the surface of thesecond crystalline semiconductor material distal from the interface, atleast a portion of the intrinsic region being disposed at the surface ofthe second crystalline semiconductor material distal from the interfaceand between the n-doped region and the p-doped region.
 18. The structureof claim 16, wherein the p-doped region is disposed in the defect regionand at least partially in the dislocation defect-free region, and then-doped region is disposed in the dislocation defect-free region of thesecond crystalline semiconductor material and at a surface of the secondcrystalline semiconductor material distal from the interface, theintrinsic region being disposed in the dislocation defect-free region ofthe second crystalline semiconductor material and between the n-dopedregion and the p-doped region.
 19. The structure of claim 16, whereinthe trench is in a dielectric layer on a top surface of a substrate, thesubstrate comprising the first crystalline semiconductor material. 20.The structure of claim 16, wherein the trench is in a recess of asubstrate, the substrate comprising the first crystalline semiconductormaterial.